摘要: 通过自制的铝电解电容器模型，利用氧化铝薄膜具有的介电性能，通过电容量法可以准确快捷地计算氧化膜的厚度，并通过显微直接观察法、电解电量法、伏安法进行了验证。得到如下结论：所用铝条样品天然氧化膜的厚度约为8.0 nm；在H₃PO₄溶液中形成的氧化膜厚度随氧化时间变化为50～80 nm；阻档层生成率1.219。

关键词: 电子技术；阳极氧化铝；氧化膜；介电性能；厚度

中图分类号: O646.6 文献标识码:A 文章编号:1001-2028（2005）12-0064-03

Studies on Testing Measures of the Thickness on Anodized

Alumina Thin Film

LI Dong-dong, ZHU Xu-fei, MENG Da-wei, XIAO Ying-hong

(1. Collega of Materials Science and Engineering, Shanghai Jiaotong University, Shanghai 200030, China; 2. Chemical Engineering Department of Nanjing University of Sci & Tech, Nanjing 210014, China )

Abstract: It was swiftly to obtain the thickness of alumina film by using of it’s dielectric property and capacitor model，which was validated by means of EM, electric quantity and volt-ampere．The results show that, the thickness of natural oxide films is about 8.0 nm; the thickness of oxide films formed in H₃PO₄ solution is varied from 50 nm to 80 nm; 。

Key words: electronic technology; anodic aluminum oxide (AAO)；oxide film；dielectric property；thickness